The influence of voltage applied between the electrodes on optical and morphological properties of the InGaN thin films grown by thermionic vacuum arc

MakaleYayıncıda açık erişimScopus SJRQ2

Özet

The aim of this research is to investigate the optical and morphological properties of the InGaN thin films deposited onto amorphous glass substrates in two separate experiments with two different voltages applied between the electrodes, i.e. 500 and 600 V by means of the thermionic vacuum arc technique. This technique is original for thin film deposition and it enables thin film production in a very short period of time. The optical and morphological properties of the films were investigated by using field emission scanning electron microscope, atomic force microscope, spectroscopic ellipsometer, reflectometer, spectrophotometer, and optical tensiometer. Optical properties were also supported by empirical relations. The deposition rates were calculated as 3 and 3.3 nm/sec for 500 and 600 V, respectively. The increase in the voltage also increased the refractive index, grain size, root mean square roughness and surface free energy. According to the results of the wetting experiments, InGaN samples were low-wettable, also known as hydrophobic. SCANNING 38:14-20, 2016.

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RDL Kalıcı Bağlantı (PID)
https://rdlopen.rawdatalibrary.net/r/bayburt/12576Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1002/sca.21237Yayıncı resmi DOI adresi
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Scopus
22
WoS
23
OpenAlex
25
Her kaynağın kendi saydığı toplam atıf; aktarım ve zenginleştirme sırasında alındı.
Tam Kayıt
AlanDeğerDil
dc.contributor.authorÖzen, Soner
dc.contributor.authorŞenay, Volkan
dc.contributor.authorPat, Suat
dc.contributor.authorKorkmaz, Şadan
dc.date.accessioned2026-10-29T19:09:45.279191705Z
dc.date.available2026-10-29T19:09:45.279191705Z
dc.date.issued2016
dc.description.abstractThe aim of this research is to investigate the optical and morphological properties of the InGaN thin films deposited onto amorphous glass substrates in two separate experiments with two different voltages applied between the electrodes, i.e. 500 and 600 V by means of the thermionic vacuum arc technique. This technique is original for thin film deposition and it enables thin film production in a very short period of time. The optical and morphological properties of the films were investigated by using field emission scanning electron microscope, atomic force microscope, spectroscopic ellipsometer, reflectometer, spectrophotometer, and optical tensiometer. Optical properties were also supported by empirical relations. The deposition rates were calculated as 3 and 3.3 nm/sec for 500 and 600 V, respectively. The increase in the voltage also increased the refractive index, grain size, root mean square roughness and surface free energy. According to the results of the wetting experiments, InGaN samples were low-wettable, also known as hydrophobic. SCANNING 38:14-20, 2016.
dc.identifier.doi10.1002/sca.21237
dc.identifier.eissn1932-8745
dc.identifier.endpage20
dc.identifier.issn0161-0457
dc.identifier.issue1
dc.identifier.pmid26381668
dc.identifier.scopus2-s2.0-84942052792
dc.identifier.startpage14
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/bayburt/12576
dc.identifier.volume38
dc.identifier.wosWOS:000373154600002
dc.language.isoen
dc.publisherJohn Wiley and Sons Inc.
dc.relation.ispartofScanning
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectInGaN thin films
dc.subjectoptical properties
dc.subjectsurface free energy
dc.subjectsurface properties
dc.subjectthermionic vacuum arc
dc.subject.classificationInstruments & Instrumentation
dc.subject.classificationMicroscopy
dc.subject.otherAmorphous films
dc.subject.otherAtomic force microscopy
dc.subject.otherDeposition
dc.subject.otherDeposition rates
dc.subject.otherElectrodes
dc.subject.otherFree energy
dc.subject.otherOptical properties
dc.subject.otherRefractive index
dc.subject.otherScanning electron microscopy
dc.subject.otherSubstrates
dc.subject.otherSurface properties
dc.subject.otherThin films
dc.subject.otherVacuum applications
dc.subject.otherVacuum technology
dc.subject.otherWetting
dc.subject.otherglass
dc.subject.otherEmpirical relations
dc.subject.otherField emission scanning electron microscopes
dc.subject.otherMorphological properties
dc.subject.otherRoot mean square roughness
dc.subject.otherSpectroscopic ellipsometers
dc.subject.otherSurface free energy
dc.subject.otherThermionic vacuum arc
dc.subject.otherThin-film depositions
dc.subject.otheranalytical equipment
dc.subject.otherArticle
dc.subject.otheratomic force microscope
dc.subject.otherelectric potential
dc.subject.otherelectrode
dc.subject.otherenergy
dc.subject.otherfilm
dc.subject.othergrain
dc.subject.otherhydrophobicity
dc.subject.othermorphology
dc.subject.otheroptical tensiometer
dc.subject.otheroptics
dc.subject.otherpriority journal
dc.subject.otherreflectometer
dc.subject.otherrefraction index
dc.subject.otherscanning electron microscope
dc.subject.otherspectrophotometer
dc.subject.otherspectroscopic ellipsometer
dc.subject.otherthermionic vacuum arc technique
dc.subject.othervacuum
dc.subject.otherOptical films
dc.titleThe influence of voltage applied between the electrodes on optical and morphological properties of the InGaN thin films grown by thermionic vacuum arc
dc.typeArticle
rdl.citation.openalex25
rdl.citation.scopus22
rdl.citation.wos23
rdl.departmentDepartment of Physics, Eskişehir Osmangazi University, Meşelik Campus, Turkey
rdl.departmentPrimary Science Education Department, Bayburt University, Turkey
rdl.oa.statusgreen
rdl.oa.statuspreprint
rdl.scopus.quartileQ2
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.source.indexPUBMED
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)