Some Physical Attributes of a Cr-Doped Iron Oxide Thin Film Produced by Simultaneous RF and DC Magnetron Sputtering Technique

Iron oxide has recently attracted considerable interest because of its diverse structural and morphological configurations, leading to progressions in various technologies, including ultrahigh magnetic storage, magneto-optical sensors, humidity sensors, and gas sensors. In this research, a thin film of iron oxide doped with chromium was produced on a glass substrate using simultaneous RF and DC magnetron sputtering. The resulting thin film's optical, structural, elemental, and surface characteristics were thoroughly investigated using UV-VIS spectroscopy, XRD, XPS, AFM, and SEM. XRD was utilized to examine the structure of the thin film, which demonstrated good crystallinity. Notably, prominent diffraction peaks at various angles corresponded to specific planes of the normal hematite phase of Fe2O3, as verified by the JCPDS Card No. 33-0664. A significant peak at (104) indicated a sturdy development of the hematite phase. The XPS spectrum analysis approved the presence of iron, oxygen, and chromium in the thin film. This study, known for its straightforward methodology, provides valuable insights into the chromium impurity doping process of Fe2O3, contributing to a deeper understanding of its structural and morphological characteristics.