Zn/ZnSe thin films deposition by RF magnetron sputtering

MakaleAçık ErişimScopus SJRQ2

Özet

In this paper, Zn/ZnSe thin films were deposited on glass substrates by RF magnetron sputtering system. XRD analyses were done. Zn and ZnSe phases were obtained. Miller indices of obtained Zn phases were detected in (320), (620) and (112) crystal formation. For the ZnSe phases, only one peak of (110)/(220) was observed. The surface morphology of the samples was investigated by an atomic force microscopy tools. It found that average roughness of the films was increased by raised RF power. The thin films around 80 % of high transmittance were measured. The band gap values were calculated as to be ~2.80 eV by the Cauchy model. The calculated refractive indices values were approximately 2.25 by a relation between the refractive index and the band gap.

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https://rdlopen.rawdatalibrary.net/r/bayburt/12592Resmi atıflarda kullanılan kalıcı adres
DOI
https://doi.org/10.1007/s10854-016-5866-6Yayıncı resmi DOI adresi
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Atıflar
Scopus
31
WoS
24
OpenAlex
29
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Tam Kayıt
AlanDeğerDil
dc.contributor.authorYudar, H. Hakan
dc.contributor.authorPat, Suat
dc.contributor.authorKorkmaz, Şadan
dc.contributor.authorÖzen, Soner
dc.contributor.authorŞenay, Volkan
dc.date.accessioned2026-10-29T19:09:46.415584700Z
dc.date.available2026-10-29T19:09:46.415584700Z
dc.date.issued2017
dc.description.abstractIn this paper, Zn/ZnSe thin films were deposited on glass substrates by RF magnetron sputtering system. XRD analyses were done. Zn and ZnSe phases were obtained. Miller indices of obtained Zn phases were detected in (320), (620) and (112) crystal formation. For the ZnSe phases, only one peak of (110)/(220) was observed. The surface morphology of the samples was investigated by an atomic force microscopy tools. It found that average roughness of the films was increased by raised RF power. The thin films around 80 % of high transmittance were measured. The band gap values were calculated as to be ~2.80 eV by the Cauchy model. The calculated refractive indices values were approximately 2.25 by a relation between the refractive index and the band gap.
dc.identifier.doi10.1007/s10854-016-5866-6
dc.identifier.eissn1573-482X
dc.identifier.endpage2837
dc.identifier.issn0957-4522
dc.identifier.issue3
dc.identifier.scopus2-s2.0-84991086674
dc.identifier.startpage2833
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/bayburt/12592
dc.identifier.volume28
dc.identifier.wosWOS:000394224600067
dc.language.isoen
dc.publisherSpringer New York LLC
dc.relation.ispartofJournal of Materials Science: Materials in Electronics
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subject.classificationEngineering, Electrical & Electronic
dc.subject.classificationMaterials Science, Multidisciplinary
dc.subject.classificationPhysics, Applied
dc.subject.classificationPhysics, Condensed Matter
dc.subject.classificationEngineering
dc.subject.classificationMaterials Science
dc.subject.classificationPhysics
dc.subject.otherAtomic force microscopy
dc.subject.otherDeposition
dc.subject.otherEnergy gap
dc.subject.otherMagnetron sputtering
dc.subject.otherRefractive index
dc.subject.otherSubstrates
dc.subject.otherZinc
dc.subject.otherBand-gap values
dc.subject.otherCauchy model
dc.subject.otherCrystal formation
dc.subject.otherGlass substrates
dc.subject.otherHigh transmittance
dc.subject.otherMiller indices
dc.subject.otherrf-Magnetron sputtering
dc.subject.otherThin films deposition
dc.subject.otherThin films
dc.titleZn/ZnSe thin films deposition by RF magnetron sputtering
dc.typeArticle
rdl.citation.openalex29
rdl.citation.scopus31
rdl.citation.wos24
rdl.oa.statusclosed
rdl.oa.statusgreen
rdl.oa.urlhttps://hdl.handle.net/20.500.12403/521
rdl.scopus.quartileQ2
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)