Yazarlar
- Korkmaz, Şadan(6)
- Pat, Suat(6)
- Özen, Soner(6)
- Şenay, Volkan(6)
- Geçici, Birol(1)
Yayınlar
- MakaleYalnız künye2017Scopus SJRQ1A study on some physical properties of a Pb-doped GaAs thin film produced by thermionic vacuum arc
Şenay, Volkan; Özen, Soner; Pat, Suat; Korkmaz, Şadan
A 155 nm Pb-doped GaAs thin film was deposited on a glass substrate by means of the thermionic vacuum arc technique in 30 s using GaAs and Pb pellets as source materials. Tools and techniques such as an optical reflectometer, UV-VIS-NIR spectrophotometer, FESEM, EDX, AFM and optical tensiometer were employed to investigate the physical properties of the produced film. From the optical investigations, the refractive index at the wavelength of 632.8 nm and optical band gap of the film were found to be 4.03 and 1.13 eV respectively. It was observed that Pb doping increased the value of refractive index and decreased the band gap value. A uniform surface morphology with fine grain covering the entire surface was observed through the FESEM and AFM studies while 50–80 nm grain size and 2.22 nm root mean square roughness values were obtained. The EDX analysis confirmed the presence of Ga, As and Pb elements in the film. The wetting experiments revealed that the contact angle value was dependent on the liquid used. The surface free energy calculated with OWRK/Fowkes and Equation of State approaches were about 26 mN/m.
AtıfScopus6WoS6OpenAlex5
İncele - MakaleYalnız künye2016Scopus SJRQ1Optical, structural, morphological and compositional characterization of a Co-doped GaAs semiconducting thin film produced by thermionic vacuum arc
Şenay, Volkan; Özen, Soner; Pat, Suat; Korkmaz, Şadan
A 80 nm 2 at% Co-doped GaAs thin film was deposited on a glass substrate under a high vacuum condition by means of the thermionic vacuum arc technique using GaAs and Co pellets as source materials. Tools and techniques such as an optical reflectometer, XRD, UV-VIS-NIR spectrophotometer, FESEM, EDX, and AFM were employed to investigate some of the physical properties of the produced film. From the optical investigations, the refractive index at 632.8 nm and optical band gap of the film were determined to be 3.60 and 1.42 eV respectively. XRD characterization indicated that the film contained GaAs and Co phases. A uniform surface morphology with fine grain covering the entire surface was observed through the FESEM and AFM studies, while 30 nm grain size and 2.72 nm root mean square roughness were obtained. The EDX analysis also confirmed the presence of Ga, As and Co in the film.
AtıfScopus19WoS17OpenAlex18İncele - MakaleAçık Erişim2016Scopus SJRQ2Optical, morphological and mechanical properties of an Al-Al2O3 nanocomposite thin film grown by thermionic vacuum arc
Şenay, Volkan; Özen, Soner; Pat, Suat; Korkmaz, Şadan
An Al-Al2O3 nanocomposite thin film was deposited onto a glass substrate in high vacuum condition using Al2O3 pellets as source material by means of the thermionic vacuum arc technique in just 50 s. UV-visible spectrophotometer, optical reflectometer, spectroscopic ellipsometer, XRD, FESEM and AFM were employed to investigate the optical, structural morphological and mechanical properties of the produced film. The film exhibited a high transmittance (above 80%) in the 400-1000 nm region. The dispersion of the refractive index was discussed in terms of the single oscillator model. The optical band gap value derived from the Wemple-DiDomenico dispersion relationship was 5.7 eV. It was observed that the results of the optical investigations agreed well with Al2O3 thin films. XRD characterization showed that the film contained Al and Al2O3 phases. The FESEM analysis revealed that the film morphology had a dense characteristic. 2D and 3D AFM micrographs indicated a smooth surface with a low value of average roughness. When compared to the mechanical properties of Al2O3 thin films, it was observed that the hardness and Young's modulus reduced due to presence of ductile Al particles.
AtıfScopus9WoS8OpenAlex11İncele - MakaleYalnız künye2015Scopus SJRQ2Some physical properties of a Si-doped nano-crystalline GaAs thin film grown by thermionic vacuum arc
Şenay, Volkan; Özen, Soner; Pat, Suat; Korkmaz, Şadan
Abstract A 160 nm thick Si-doped nano-crystalline GaAs film was grown on a glass substrate by means of the thermionic vacuum arc in just 50 s. Tools and techniques such as an optical reflectometer, Uv-Vis-NIR spectrophotometer, XRD, FESEM, AFM, Hall effect measurement, and diiodomethane, ethylene glycol, formamide, and water contact angle measurements were employed to investigate some of the physical properties of the produced film. XRD characterization indicated that the film contained GaAs (hexagonal system in atomic ratio of 1) and SiAs (monoclinic system in atomic ratio of 1) phases. The grain size obtained from Scherrer's Formula was in the range of 30-40 nm. The AFM micrographs showed the film topography, revealing a surface root mean square roughness of 14.5 nm and average height of 48.3 nm. From the wetting experiments, it was found that the contact angle value is strongly dependent on the liquid used.
AtıfScopus20WoS18OpenAlex21İncele - MakaleAçık Erişim2015Scopus SJRQ1Investigation on the morphology and surface free energy of the AlGaN thin film
Özen, Soner; Şenay, Volkan; Pat, Suat; Korkmaz, Şadan
The purpose of this paper is to analyze surface properties of AlGaN thin film produced using thermionic vacuum arc technique. Thermionic vacuum arc is an alternative deposition technique for GaN thin films that produces in a very short production time for GaN-based solid-state applications. XRD results showed that AlGaN thin film with cubic crystal structure on a amorphous glass was grown. Conductivity type of AlGaN thin film is determined as p-type by hot-probe method which is a very simple method. The surface morphology was analyzed and discussed using field emission scanning electron microscopy (FESEM) and atomic force microscopy. The contact angles in four different testing liquid and surface free energy of the AlGaN thin film were investigated by optical tensiometer.
AtıfScopus27WoS27OpenAlex28İncele - MakaleYalnız künye2015Scopus SJRQ3Some physical properties of the SiGe thin film coatings by thermionic vacuum arc (TVA)
Özen, Soner; Pat, Suat; Şenay, Volkan; Korkmaz, Şadan; Geçici, Birol
SiGe thin films were deposited on glass and PET substrate by the thermionic vacuum arc (TVA) method for the first time. TVA is an anodic plasma generator which works in high vacuum conditions. Highly pure and quality films can be deposited on different substrates by means of this method. In order to characterize the produced films, X-ray diffraction, field emission scanning electron microscope (FESEM), atomic force microscope (AFM), energy dispersive X-ray spectrometer (EDX), optical tensiometer, UV-Vis spectrophotometer and spectroscopic ellipsometer (SE) devices were used. The obtained XRD peaks at 47° and 75° are described to the reflections of (220) and (331) planes of Ge or Si. According to the measurement results, substrates materials are affect the surface and optical properties of the deposited SiGe layers. SiGe coated samples with low optical band gaps exhibit low transparency and high absorption. The structures are homogenous and less rough.
AtıfScopus15WoS16OpenAlex14İncele