A study on the optical, chemical and dielectric properties of PPCIN thin films derived from essential oil compounds using RF plasma polymerisation technique

MakaleAçık ErişimScopus SJRQ2

Özet

Polymer-based nanostructured films were produced on various substrates using Radio Frequency (RF) plasma polymerization technique from Cinnamaldehyde monomer which is an organic compound. To fabricate polymer thin film, the pressure, the deposition time and RF power were set to 480 mTorr, 30 min and 15, 20 and 30 W, respectively. The effect of RF power on the optical, morphological and chemical properties of thin films were investigated. The optical, morphological and chemical properties were determined by UV–Vis spectroscopy, Atomic Force Microscopy (AFM) and FTIR spectroscopy, respectively. The average surface roughness of thin films was detected as 5.7 nm, 3.9 nm and 11.7 nm using AFM depending on the increase in RF power. Using FTIR spectroscopy, the chemical structure of the polymer thin films was compared with that of the monomer material, and it was found that the majority of the functional groups belonging to the monomers also appeared in the thin films. Optical band gap of thin films increased with RF power and these values were determined as 2.83 eV, 3.05 eV and 2.98 eV, respectively. The extinction coefficients and refractive indices of the thin films were measured at 500 nm between 0.00183–0.00522 and 2.40–2.78, respectively.

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AlanDeğerDil
dc.contributor.authorBayram, Ozkan
dc.contributor.authorSimsek, Onder
dc.date.accessioned2026-10-29T19:09:19.504393433Z
dc.date.available2026-10-29T19:09:19.504393433Z
dc.date.issued2018
dc.description.abstractPolymer-based nanostructured films were produced on various substrates using Radio Frequency (RF) plasma polymerization technique from Cinnamaldehyde monomer which is an organic compound. To fabricate polymer thin film, the pressure, the deposition time and RF power were set to 480 mTorr, 30 min and 15, 20 and 30 W, respectively. The effect of RF power on the optical, morphological and chemical properties of thin films were investigated. The optical, morphological and chemical properties were determined by UV–Vis spectroscopy, Atomic Force Microscopy (AFM) and FTIR spectroscopy, respectively. The average surface roughness of thin films was detected as 5.7 nm, 3.9 nm and 11.7 nm using AFM depending on the increase in RF power. Using FTIR spectroscopy, the chemical structure of the polymer thin films was compared with that of the monomer material, and it was found that the majority of the functional groups belonging to the monomers also appeared in the thin films. Optical band gap of thin films increased with RF power and these values were determined as 2.83 eV, 3.05 eV and 2.98 eV, respectively. The extinction coefficients and refractive indices of the thin films were measured at 500 nm between 0.00183–0.00522 and 2.40–2.78, respectively.
dc.identifier.doi10.1016/j.vacuum.2018.07.032
dc.identifier.endpage204
dc.identifier.issn0042-207X
dc.identifier.scopus2-s2.0-85050532200
dc.identifier.startpage198
dc.identifier.urihttps://rdlopen.rawdatalibrary.net/r/bayburt/12209
dc.identifier.volume156
dc.identifier.wosWOS:000445980600026
dc.language.isoen
dc.publisherElsevier Ltd
dc.relation.ispartofVacuum
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectEssential oil
dc.subjectOrganic semiconductors
dc.subjectPlasma polymerization
dc.subjectPPCIN
dc.subjectRF power
dc.subject.classificationMaterials Science, Multidisciplinary
dc.subject.classificationPhysics, Applied
dc.subject.classificationMaterials Science
dc.subject.classificationPhysics
dc.subject.otherAtomic force microscopy
dc.subject.otherChemical properties
dc.subject.otherDeposition
dc.subject.otherDielectric properties of solids
dc.subject.otherEnergy gap
dc.subject.otherEssential oils
dc.subject.otherFourier transform infrared spectroscopy
dc.subject.otherMonomers
dc.subject.otherPlasma polymerization
dc.subject.otherPolymer films
dc.subject.otherRefractive index
dc.subject.otherSemiconducting organic compounds
dc.subject.otherSurface roughness
dc.subject.otherThin films
dc.subject.otherAverage surface roughness
dc.subject.otherEssential oil compounds
dc.subject.otherExtinction coefficients
dc.subject.otherNanostructured Films
dc.subject.otherPPCIN
dc.subject.otherRadio frequency plasma
dc.subject.otherRf-power
dc.subject.otherStructure of the polymers
dc.subject.otherOptical films
dc.titleA study on the optical, chemical and dielectric properties of PPCIN thin films derived from essential oil compounds using RF plasma polymerisation technique
dc.typeArticle
rdl.citation.openalex16
rdl.citation.scopus14
rdl.citation.wos14
rdl.oa.statusgreen
rdl.oa.statuspreprint
rdl.oa.urlhttps://hdl.handle.net/20.500.12501/762
rdl.scopus.quartileQ2
rdl.source.indexSCOPUS
rdl.source.indexWOS
rdl.wos.indexScience Citation Index Expanded (SCI-EXPANDED)