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1 →- Derleme MakaleYalnız künye2016Scopus SJRQ4Influence of oxygen partial pressure on the metastable copper oxide thin films
Geçici, Birol; Korkmaz, Šadan; Özen, Soner; Šenay, Volkan; Pat, Suat
Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O2) gas mixture atmospheres. Ar/O2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39° and 35.49° , corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region.
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Tam Kayıt
| Alan | Değer | Dil |
|---|---|---|
| creativeworkseries.issn | 0217-9849 | |
| dc.date.accessioned | 2026-10-29T19:09:45.547591020Z | |
| dc.date.available | 2026-10-29T19:09:45.547591020Z | |
| dc.identifier.uri | https://rdlopen.rawdatalibrary.net/r/bayburt/12580 | |
| dc.publisher | World Scientific Publishing Co. Pte Ltd | |
| dc.rights | info:eu-repo/semantics/openAccess | |
| dc.title | Modern Physics Letters B |
