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oai:bayburt-rdlopen.rawdatalibrary.net:bayburt/125792026-10-29T19:42:36Zopenairecom_bayburt_10000col_bayburt_10001com_bayburt_10007col_bayburt_10218

Influence of oxygen partial pressure on the metastable copper oxide thin filmsGeçici, BirolKorkmaz, ŠadanÖzen, SonerŠenay, VolkanPat, SuatAFMMetastable copper oxide thin filmreactive RF sputterXRDParamelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O2) gas mixture atmospheres. Ar/O2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39° and 35.49° , corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region.World Scientific Publishing Co. Pte Ltd2016Review Articlehttps://rdlopen.rawdatalibrary.net/r/bayburt/12579https://doi.org/10.1142/s02179849153001240217-9849enModern Physics Letters Binfo:eu-repo/semantics/closedAccessinfo:eu-repo/semantics/reviewhttps://bayburt-rdlopen.rawdatalibrary.net/tr/items/bayburt/12579